• Ultra-High Purity Material Titanium Sputtering Target Ti Sputtering Round Target Semiconductor Use
  • Ultra-High Purity Material Titanium Sputtering Target Ti Sputtering Round Target Semiconductor Use
  • Ultra-High Purity Material Titanium Sputtering Target Ti Sputtering Round Target Semiconductor Use
  • Ultra-High Purity Material Titanium Sputtering Target Ti Sputtering Round Target Semiconductor Use
  • Ultra-High Purity Material Titanium Sputtering Target Ti Sputtering Round Target Semiconductor Use
  • Ultra-High Purity Material Titanium Sputtering Target Ti Sputtering Round Target Semiconductor Use

Ultra-High Purity Material Titanium Sputtering Target Ti Sputtering Round Target Semiconductor Use

Type: Sputtering Target
Application: Semiconductor
Technique: Rolling, Finishing
Grade: 3n-5n5
Shape: Round
Transport Package: Wooden Box
Customization:
Diamond Member Since 2023

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Manufacturer/Factory, Trading Company
  • Overview
  • Product Description
  • Detailed Photos
  • Certifications
  • Packaging & Shipping
  • Company Profile
  • FAQ
Overview

Basic Info.

Model NO.
Titanium sputtering target
Specification
Round
Trademark
CRNMC
Origin
Ningbo
HS Code
8108901090

Product Description

Product Description

Product name

High purity titanium target (target blank)

Production Process

Rolling, finishing

Production base

Ningbo Chuangrun Base

Product specifications

Processing according to customer drawings

Product packaging

Wooden box

Minimum order quantity

1 item

Remark

 
 

Project

3N

3N5

4N

4N5

5N

5N5

unit

Detection method

Total purity

≥99.9

≥99.95

≥99.99

≥99.99

≥99.995

≥99.9995

% [wt]

 

Ag

-

-

1

0.5

0.01

0.01

ppm [wt]

GDMS

Al

-

50

10

3

2

2

ppm [wt]

GDMS

As

-

-

10

1

0.5

0.5

ppm [wt]

GDMS

Au

-

-

1

0.5

0.25

0.25

ppm [wt]

GDMS

B

-

1

-

0.1

0.05

0.05

ppm [wt]

GDMS

Be

-

-

-

0.5

0.5

0.5

ppm [wt]

GDMS

Bi

-

-

-

0.1

0.05

0.05

ppm [wt]

GDMS

Ca

-

-

1

1

0.5

0.5

ppm [wt]

GDMS

Cd

-

-

-

1

0.2

0.2

ppm [wt]

GDMS

Cl

600

10

5

1

0.1

0.1

ppm [wt]

GDMS

Co

-

-

5

1

0.05

0.05

ppm [wt]

GDMS

Cr

-

20

5

1

0.8

0.8

ppm [wt]

GDMS

Cu

-

50

5

2

1

1

ppm [wt]

GDMS

F

-

-

-

15

0.5

0.5

ppm [wt]

GDMS

Fe

700

200

10

7

5

3

ppm [wt]

GDMS

Hg

-

-

-

0.5

0.5

0.1

ppm [wt]

GDMS

K

-

0.1

0.1

0.05

0.05

0.01

ppm [wt]

GDMS

Li

-

0.1

0.1

0.05

0.05

0.005

ppm [wt]

GDMS

Mg

-

1

2

1

0.1

0.1

ppm [wt]

GDMS

Mn

-

10

5

1

1

0.5

ppm [wt]

GDMS

Mo

-

-

4

1

0.05

0.05

ppm [wt]

GDMS

Na

-

-

0.2

0.03

0.03

0.03

ppm [wt]

GDMS

Ni

250

25

5

1

0.5

0.5

ppm [wt]

GDMS

P

-

-

-

1

0.25

0.01

ppm [wt]

GDMS

Pb

-

-

-

1

0.1

0.01

ppm [wt]

GDMS

Pd

-

-

-

0.1

0.1

0.01

ppm [wt]

GDMS

S

-

-

10

10

5

3

ppm [wt]

GDMS

Sb

-

-

7

0.5

0.5

0.05

ppm [wt]

GDMS

Si

200

50

5

2

1

1

ppm [wt]

GDMS

Sn

-

-

5

1

0.5

0.01

ppm [wt]

GDMS

Te

-

-

-

0.5

0.5

0.05

ppm [wt]

GDMS

Th

-

0.001

0.001

0.0005

0.0001

0.0001

ppm [wt]

GDMS

U

-

0.001

0.001

0.0005

0.0001

0.0001

ppm [wt]

GDMS

V

-

-

-

1

1

1

ppm [wt]

GDMS

W

-

-

-

1

0.1

0.1

ppm [wt]

GDMS

Zn

-

-

5

1

0.1

0.1

ppm [wt]

GDMS

Zr

-

-

5

3

1

1

ppm [wt]

GDMS

Ba

-

-

-

0.1

0.1

0.1

ppm [wt]

GDMS

Br

-

-

-

0.5

0.5

0.5

ppm [wt]

GDMS

Ce

-

-

-

0.1

0.1

0.1

ppm [wt]

GDMS

Cs

-

-

-

0.1

0.1

0.1

ppm [wt]

GDMS

Ga

-

-

-

0.5

0.5

0.5

ppm [wt]

GDMS

Ge

-

-

-

0.5

0.5

0.5

ppm [wt]

GDMS

Hf

-

-

-

1

1

1

ppm [wt]

GDMS

I

-

-

-

0.1

0.1

0.1

ppm [wt]

GDMS

In

-

-

-

0.1

0.1

0.1

ppm [wt]

GDMS

La

-

-

-

0.1

0.1

0.1

ppm [wt]

GDMS

Pt

-

-

-

0.1

0.1

0.1

ppm [wt]

GDMS

Re

-

-

-

0.1

0.1

0.1

ppm [wt]

GDMS

Rh

-

-

-

0.2

0.2

0.2

ppm [wt]

GDMS

Ru

-

-

-

0.1

0.1

0.1

ppm [wt]

GDMS

Sc

-

-

-

0.1

0.1

0.1

ppm [wt]

GDMS

Se

-

-

-

0.5

0.5

0.5

ppm [wt]

GDMS

Pr

-

-

-

0.1

0.1

0.1

ppm [wt]

GDMS

Nd

-

-

-

0.1

0.1

0.1

ppm [wt]

GDMS

Sm

-

-

-

0.1

0.1

0.1

ppm [wt]

GDMS

Eu

-

-

-

0.1

0.1

0.1

ppm [wt]

GDMS

Gd

-

-

-

0.1

0.1

0.1

ppm [wt]

GDMS

Tb

-

-

-

0.1

0.1

0.1

ppm [wt]

GDMS

Dy

-

-

-

0.1

0.1

0.1

ppm [wt]

GDMS

Ho

-

-

-

0.1

0.1

0.1

ppm [wt]

GDMS

Er

-

-

-

0.1

0.1

0.1

ppm [wt]

GDMS

Tm

-

-

-

0.1

0.1

0.1

ppm [wt]

GDMS

Yb

-

-

-

0.1

0.1

0.1

ppm [wt]

GDMS

Lu

-

-

-

0.1

0.1

0.1

ppm [wt]

GDMS

Os

-

-

-

0.1

0.1

0.1

ppm [wt]

GDMS

Ir

-

-

-

0.1

0.1

0.1

ppm [wt]

GDMS

Pt

-

-

-

0.1

0.1

0.1

ppm [wt]

GDMS

Tl

-

-

-

0.1

0.1

0.1

ppm [wt]

GDMS

C

200

150

50

30

30

30

ppm [wt]

LECO

H

50

10

5

10

6

6

ppm [wt]

LECO

N

200

100

50

30

30

30

ppm [wt]

LECO

O

800

700

450

300

200

100

ppm [wt]

LECO

Detailed Photos

Ultra-High Purity Material Titanium Sputtering Target Ti Sputtering Round Target Semiconductor Use

Certifications

Ultra-High Purity Material Titanium Sputtering Target Ti Sputtering Round Target Semiconductor Use

Packaging & Shipping

Ultra-High Purity Material Titanium Sputtering Target Ti Sputtering Round Target Semiconductor Use

Company Profile

Ultra-High Purity Material Titanium Sputtering Target Ti Sputtering Round Target Semiconductor UseUltra-High Purity Material Titanium Sputtering Target Ti Sputtering Round Target Semiconductor Use

FAQ

Ultra-High Purity Material Titanium Sputtering Target Ti Sputtering Round Target Semiconductor Use


Ultra-High Purity Material Titanium Sputtering Target Ti Sputtering Round Target Semiconductor Use

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Diamond Member Since 2023

Suppliers with verified business licenses

Manufacturer/Factory, Trading Company
Registered Capital
61047775 RMB
Plant Area
13048 square meters